Equipment
CNN Equipment
CNN Equipment
Available Equipment
Fabrication
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Scanning E-beam Writer
JEOL JSX 6400: (
Training,
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Schedule
)
Fitted with the Deben beamblanker and Nabity NPGS System for
e-beam writing with lateral resolution of 40 nm with the current
tungsten
filament configuration. Planned modifications in the future include the
addition of a X-ray spectrometer, a low-temperature stage and a
lanthanum-hexaboride (LAB6) filament configuration for sub-10-nm
resolution
e-beam writing.
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Mask Aligner -
Karl-Suss MJB-3: ( Training,
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Schedule
)
Fitted with a UV light source for optical lithography down
to a resolution of 5 microns. NRF also has a large collection of
e-beam-written
4-inch masks, which include a variety of mesa structures.
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K&S
Wirebonder:
The K&S 484 wirebonder is a mechanical wedge bonder.
Fitted with an ultrasonic source, it enables wirebonding of gold and
aluminum
wires (down to 1 mil (25 micron) diameter) to thin electrical pads.
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Atomic Layer Deposition System: (
Training,
View
Schedule
)
Savannah 100, Cambridge
NanoTech
Clean-Room with Laminar Flow Hood
(For photo-resist, e-beam resist spinning)
Fume Hoods (2) For wet acid etches. (A third
fume hood and two additional laminar flow hoods are
also available for experiments requiring dedicated hood space).
Edwards Multi-Source Thermal Evaporator
Vacuum thermal evaporator for multilayered materials
deposition.
High-Purity Thermal Evaporator with
Plasma Stripper Homemade Ultra-Pure Thermal Evaporator (for use of
5N gold
only), fitted with a home-built in situ plasma cleaner.
Headway
Research Spinner For use of e-beam and photoresists.
Multiple Thermodyne Ovens and Ultrasound Cleaners
OAI UV light
source for exposure and stripping
Lindberg Tube Furnace (1200o
C)
Pelco CPD2 Critical Point Dryer
Home-Built Nitrite/Oxide Sputtering System (not yet
completed)
Home-Built Reactive Ion Etch (RIE) System (not yet
completed)
Lab
Manager: Prof. Raj
Mohanty
Lab Manager: Dr. Ze'ev Feit
Lab Manager: Dr. Xin Brown
Lab Manager: Dr. Phil Allen
Class
1000 Clean Room (ERB 712)
Plasma Asher (Oxygen,
Argon)
Mask Aligner MA6/BA6
(Suss - 3", 4" wafers)
Ellipsometer (Automatic,
3 wavelengths- Rudolph)
Spinner with 2 Hot Plates (Suss,
Delta80 T3)
E-Beam evaporator (Sharon
Vacuum, Telemark e-Beamx2 Guns)
PECVD (Oerlikon 790
for low stress growth of SiO2, Si3N4)
Salare wet laminar flow Chemical
hood with Sunk in baths (3 Acid, Bases/Developers,
3 solvent, 1 Dump rinse, 1 Ultrasonic)
Semitool Rinse/Dryer (for
3", 4" wafers)
Class 100 Clean Room (ERB
718)
MJB3 Mask Aligner (Suss,
3" wafers)
Dektak 8 Profiler
Zeiss Microscope
SPI Barrel Asher (Small)
Programmable Spinner (+
2 Hot plates in 8' chemical Hood)
Wet Hood (8')
Lab
Managers: Dr. Ze'ev Feit, Prof. Amit Meller
Materials Property
Characterization Equipment
Class 100 Photolithography Cleanroom
Bonding Equipment
Alignment Stations
Curing Stations
Test Equipment
Spectroscopy Equipment
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